Multilayer wiring board, semiconductor device mounting board using same, and method of manufacturing multilayer wiring board

ABSTRACT

A multilayer wiring board with a high degree of heat resistance, which is capable of low temperature fusion without the occurrence of resin flow, enables high precision, finely detailed conductive wiring, can be ideally applied to low volume high mix manufacturing configurations, and also has little impact on the environment is provided, together with a semiconductor device mounting board using such a multilayer wiring board, and a method of manufacturing such a multilayer wiring board. In the multilayer wiring board, grooves for forming a wiring circuit and via holes are formed in an insulating substrate formed from a thermoplastic resin composition comprising a polyarylketone resin with a crystalline melting peak temperature of at least 260° C. and an amorphous polyetherimide resin as the primary constituents, a metallic foil is embedded within the grooves so that the surface of the foil protrudes to the surface of the insulating substrate, and a conductive material formed by curing a conductive paste is used for filling the via holes.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a multilayer wiring board, asemiconductor device mounting board using such a wiring board, and amethod of manufacturing such a multilayer wiring board.

2. Description of the Background Art

In recent years, the trend towards increased miniaturization andfunctionality of electronic equipment has produced a growing demand forhigher density mounting of electronic components on the mounting boardsused for mounting such electronic equipment. In order to enable theseelectronic components to be mounted on the mounting boards with higherdensities, there are calls not only for further miniaturization of theelectronic components, but also for finer and higher precision wiringprocessing on the printed wiring boards.

On the other hand, in order to ensure a minimal environmental impact,these days it is also necessary to consider the recycling of theaforementioned mounting boards. Consequently, wiring boards comprising athermoplastic resin as a primary material have been attractingconsiderable attention.

These wiring boards use a highly heat resistant thermoplastic resinknown as super engineering plastic, and not only enable finely detailed,high precision wiring processing, but also offer a number of otheradvantages including a high degree of mechanical strength, superiorelectrical insulation, and comparative ease of recycling. As a result,in order to meet the demands for increased wiring density, considerableresearch is being conducted into the use of highly heat resistantthermoplastic resins as the substrate materials for printed wiringboards.

Examples of thermoplastic resins which are used as these substratematerials include liquid crystal polymers and thermoplastic polyimides.

Furthermore, in a printed wiring board using one of these thermoplasticresins, a predetermined wiring circuit is formed on top of the printedwiring board in a similar manner to a conventional general purposeprinted wiring board, namely using a so-called wet process in whichcopper foil is laminated on top of the printed wiring board, and thecopper foil is then subjected to etching treatment using wet etching orthe like to form the wiring pattern.

Other methods of forming the wiring circuit on the printed wiring boardinclude methods in which the wiring circuit is formed by a dry process.

In these methods, screen printing techniques or dispensing techniquesare used to print a conductive paste onto the printed wiring board in apredetermined wiring pattern, and this conductive paste is thensubjected to heat treatment to complete the formation of a predeterminedwiring circuit on the printed wiring board.

This method of printing on a conductive paste does not require the wetetching process used in conventional copper foil etching methods, andconsequently the manufacturing process can be converted to a dryprocess, which offers the advantage of being even gentler on theenvironment.

The thermoplastic resin enables a shortening of the process tact, andalso offers the advantages of superior moldability and plasticity, andis consequently considered a very favorable material as a boardsubstrate material.

However, although conventional highly heat resistant thermoplasticresins offer advantages as highly heat resistant substrate materials,when the thermoplastic resin is laminated and integrated into a singleunit, the resin must be heated to a temperature close to the resinmelting point to ensure thermal fusion, and a problem arises during thisheating and thermal fusion in that a resin flow, resulting from thelarge reduction in the modulus of elasticity at temperatures near themelting point, may cause distortions in the conducting material whichforms the wiring circuit.

In addition, conventional printed wiring board production lines aresuited to high volume low mix production, and consequently there istendency for the production facilities to increase in size. Furthermore,chemical etching (wet etching) and plating techniques are typically usedduring the formation of wiring circuits on the printed wiring boards,and these techniques are undesirable from the viewpoint of environmentalimpact.

Furthermore as described above, examples of methods for wiring formationusing dry processes include screen printing methods and dispensingmethods using a conductive paste, although in both of these methods,there is a limit to the improvements in detail and precision of theconductive wiring which can be achieved in order to try and meet theever increasing demands for higher density mounting.

In addition, as described above, in a laminated product of athermoplastic resin on which a wiring circuit has been formed using aconductive paste, the resin must be heated to a temperature close to themelting point and subjected to pressure to fuse the thermoplastic resinlayers together to create a single integrated unit, and as the pitch ofthe wiring becomes finer, distortion of the wiring resulting from resinflow during lamination is increasingly becoming a factor which cannot beignored in substrate design.

BRIEF SUMMARY OF THE INVENTION

The present invention aims to resolve the problems described above, withan object of providing a multilayer wiring board with a high degree ofheat resistance, which is capable of low temperature fusion without theoccurrence of resin flow, enables high precision, finely detailedconductive wiring, can be ideally applied to low volume high mixmanufacturing configurations, and also has little impact on theenvironment, as well as providing a semiconductor device mounting boardusing such a multilayer wiring board, and a method of manufacturing sucha multilayer wiring board.

As a result of intensive research, the inventors of the presentinvention realized that if a substrate formed from a thermoplastic resincould be combined with a wiring pattern formed from a conductive pasteto produce a wiring board, then a high performance, environmentallyfriendly multilayer wiring board could be produced, and were hence ableto complete the present invention.

In other words, in a multilayer wiring board of the present invention, awiring circuit is formed by embedding conductive wiring within aninsulating substrate, formed from a thermoplastic resin compositioncomprising a polyarylketone resin with a crystalline melting peaktemperature of at least 260° C. and an amorphous polyetherimide resin asthe primary constituents, so that the surface of the wiring protrudes tothe surface of the resin, and a plurality of wiring substrates, formedby smoothing the surface of an insulating substrate comprising embeddedconductive wiring are laminated together, and wiring is provided whichelectrically connects the wiring substrates (1, 2, 3, 4) to one another,and the insulating substrates of these wiring substrates are bondedtogether by thermal fusion and crystallized, and the conductive wiringof the wiring circuit of each wiring substrate and the wiring used forelectrically connecting each of the wiring substrates together, isformed from a conductive material produced by curing a conductive paste.

In this type of multilayer wiring board, the insulating substrate whichforms an essential component of the wiring substrate utilizes athermoplastic resin composition comprising a polyarylketone resin with acrystalline melting peak temperature of at least 260° C. and anamorphous polyetherimide resin as the primary constituents, andconductive wiring is embedded within the insulating substrate formedfrom this thermoplastic resin composition so that the surface of thewiring protrudes to the surface of the resin composition. Bysubsequently laminating a plurality of these wiring substrates and thenbonding and crystallizing the wiring substrates through thermal fusionof the insulating substrates, a multilayer wiring board with excellentheat resistance, a high degree of mechanical strength and excellentelectrical insulation can be achieved, and in addition, low temperaturefusion is possible without the occurrence of resin flow, meaning theproblem of wiring distortions resulting from such resin flow can beresolved, making high precision, finely detailed conductive wiringpossible. As a result, a multilayer wiring board with excellentelectrical characteristics and reliability can be provided.

Furthermore, by appropriate selection of both the thermoplastic resincomposition, and the type and shape of the conductive wiring, a varietyof different wiring substrates can be formed, and as a result, bycombining wiring substrates with different specifications, the presentinvention can be applied to multilayer wiring boards with a wide varietyof specifications.

In addition, the combination of a variety of wiring substrates ofdifferent specifications makes the invention ideally suited to lowvolume high mix type manufacturing configurations. Furthermore, by usinga conductive paste for the electrical connections, wiring formationusing wet processes becomes unnecessary, meaning the environmentalimpact can be reduced.

The aforementioned insulating substrate should preferably utilize anamorphous film produced by molten mixing and then rapid cooling of athermoplastic resin composition comprising a polyarylketone resin with acrystalline melting peak temperature of at least 260° C. and anamorphous polyetherimide resin as the primary constituents.

Furthermore, the conductive wiring of the present invention preferablycomprises a conductive material formed by curing a conductive paste anda metallic foil, with at least the surface of the metallic foilprotruding to the surface of the substrate.

A semiconductor device mounting board of the present invention comprisesa multilayer wiring board of the present invention with a semiconductordevice mounted thereon.

According to a semiconductor device mounting board of the presentinvention, because the semiconductor device is mounted on a multilayerwiring board of the present invention, a high precision, finely detailedand high density semiconductor device mounting board can be producedwith relative ease.

A method of manufacturing a multilayer wiring board according to thepresent invention comprises the steps of performing thermal molding oneither one surface or both surfaces of an insulating substrate formedfrom a thermoplastic resin composition comprising a polyarylketone resinwith a crystalline melting peak temperature of at least 260° C. and anamorphous polyetherimide resin as the primary constituents, at atemperature which is higher than the glass transition temperature of thethermoplastic resin composition but lower than the crystallization starttemperature, thereby forming a conductive region comprising grooves, viaholes, or a combination of grooves and via holes on the aforementionedone surface or both surfaces, subsequently filling the conductive regionwith a conductive paste and forming a wiring circuit in which theconductive paste functions as conductive wiring, thereby forming awiring substrate comprising the insulating substrate and the wiringcircuit, and subsequently laminating a plurality of these wiringsubstrates together, bonding and crystallizing the insulating substratesof these wiring substrates by thermal fusion at a temperature higherthan the aforementioned crystallization start temperature, andelectrically connecting the plurality of wiring substrates withconductive paste.

In this method of manufacturing a multilayer wiring board, a wiringsubstrate is generated by forming a wiring circuit comprising conductivewiring formed from a conductive paste on an insulating substrate formedfrom a thermoplastic resin composition comprising a polyarylketone resinwith a crystalline melting peak temperature of at least 260° C. and anamorphous polyetherimide resin as the primary constituents, and aplurality of these wiring substrates are then laminated together, andthe insulating substrates of these wiring substrates are then bondedtogether and crystallized by thermal fusion at a temperature higher thanthe aforementioned crystallization start temperature, while each of thewiring substrates are electrically connected together with conductivepaste. Consequently, a multilayer wiring board with excellent heatresistance, a high degree of mechanical strength, excellent electricalinsulation, and with high precision and finely detailed conductivewiring can be produced with relative ease. As a result, a multilayerwiring board with excellent electrical characteristics and reliabilitycan be produced with relative ease.

Furthermore, by appropriate selection of the number of insulatingsubstrates and the wiring circuits formed thereon, a variety ofdifferent wiring substrates can be formed, and by combining these wiringsubstrates, multilayer wiring boards with a wide variety ofspecifications can be produced with relative ease, meaning low volumehigh mix multilayer wiring boards can be prepared easily, and within arelatively short time period. Furthermore, in the manufacturing process,by employing a dry process in which electrical connection is achievedvia a conductive paste, wiring formation processes relying on wetprocesses become unnecessary, meaning the environmental impact of themanufacturing process is lessened considerably.

In this method of manufacturing a multilayer wiring board, theinsulating substrate should preferably utilize an amorphous filmproduced by molten mixing and then rapid cooling of a thermoplasticresin composition comprising a polyarylketone resin with a crystallinemelting peak temperature of at least 260° C. and an amorphouspolyetherimide resin as the primary constituents.

Another method of manufacturing a multilayer wiring board according tothe present invention comprises the steps of positioning an impressingjig on one surface of an insulating substrate formed from athermoplastic resin composition comprising a polyarylketone resin with acrystalline melting peak temperature of at least 260° C. and anamorphous polyetherimide resin as the primary constituents, with ametallic foil disposed therebetween, and positioning an elastic film,which displays a lower modulus of elasticity than the insulatingsubstrate at temperatures lower than the glass transition temperature ofthe insulating substrate, on the other surface of the insulatingsubstrate, subsequently using the impressing jig for performing thermalmolding at a temperature which is higher than the glass transitiontemperature of the elastic film but lower than the crystallization starttemperature of the insulating substrate, and subsequently peeling offthe metallic foil, so that only those sections of the metallic foil inpositions corresponding with convex sections of the impressing jig arefused to the insulating substrate.

According to this method of manufacturing a multilayer wiring board, animpressing jig is positioned on one surface of the insulating substrateformed from a thermoplastic resin composition comprising apolyarylketone resin with a crystalline melting peak temperature of atleast 260° C. and an amorphous polyetherimide resin as the primaryconstituents, with a metallic foil disposed therebetween, and an elasticfilm, which displays a lower modulus of elasticity than the insulatingsubstrate at temperatures lower than the glass transition temperature ofthe insulating substrate, is positioned on the other surface of theinsulating substrate, and in this state, by carrying out thermal moldingby pressing the impressing jig against the insulating substrate at atemperature which is higher than the glass transition temperature of theelastic film but lower than the crystallization start temperature of theinsulating substrate, only those sections of the metallic foil inpositions corresponding with convex sections of the impressing jig arefused firmly to the insulating substrate. Consequently, a multilayerwiring board with excellent heat resistance, a high degree of mechanicalstrength, excellent electrical insulation, and with high precision andfinely detailed conductive wiring can be produced with relative ease. Asa result, a multilayer wiring board with excellent electricalcharacteristics and reliability can be produced with relative ease.

Furthermore, by appropriate selection of the number of insulatingsubstrates and the wiring circuits formed thereon, a variety ofdifferent insulating substrates and conductive wiring can be formed, andby combining these substrates and wiring, multilayer wiring boards witha wide variety of specifications can be produced with relative ease,meaning low volume high mix multilayer wiring boards can be preparedeasily, and within a relatively short time period. Furthermore, in themanufacturing process, by employing a dry process in which electricalconnection is achieved via a conductive paste, wiring formationprocesses relying on wet processes become unnecessary, meaning theenvironmental impact of the manufacturing process is lessenedconsiderably.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS

FIG. 1 is a cross-sectional diagram showing a multilayer wiring board ofa first embodiment of the present invention.

FIGS. 2A to 2D are process diagrams showing a method of manufacturing amultilayer wiring board of the first embodiment of the presentinvention.

FIGS. 3A to 3E are process diagrams showing a method of manufacturing amultilayer wiring board of the first embodiment of the presentinvention.

FIG. 4 is a graph showing the temperature dependency of the modulus ofelasticity of an insulating substrate and an elastic film.

FIGS. 5A to 5F are process diagrams showing a method of manufacturing amultilayer wiring board of the first embodiment of the presentinvention.

FIGS. 6A and 6B are process diagrams showing a method of manufacturing amultilayer wiring board of the first embodiment of the presentinvention.

FIG. 7 is a cross-sectional diagram showing an IC package board of asecond embodiment of the present invention.

FIGS. 8A and 8C are process diagrams showing a method of manufacturingan IC package board of the second embodiment of the present invention.

FIG. 9 is a cross-sectional diagram showing an IC package board of athird embodiment of the present invention.

FIGS. 10A and 10B are process diagrams showing a method of manufacturingan IC package board of the third embodiment of the present invention.

DETAILED DESCRIPTION OF THE INVENTION

As follows is a description of embodiments of a multilayer wiring boardof the present invention, a semiconductor device mounting board usingsuch a multilayer wiring board, and a method of manufacturing amultilayer wiring board.

First Embodiment

FIG. 1 is a cross-sectional diagram showing a multilayer wiring boardaccording to a first embodiment of the present invention. In the figure,symbol 1 represents an uppermost layer substrate (a wiring substrate ofthe uppermost layer), symbol 2 represents a lowest layer substrate (awiring substrate of the lowest layer), and symbols 3 and 4 representinner layer substrates (wiring substrates) sandwiched between theuppermost layer substrate 1 and the lowest layer substrate 4.

The uppermost layer substrate 1 is typically a film, a thin plate or asheet of a thickness of no more than 100 μm, wherein grooves 12 forforming a wiring circuit are formed in one surface (the upper surface inthe figure) of an insulating substrate 11 formed from a film, a thinplate or a sheet of a thermoplastic resin composition comprising apolyarylketone resin with a crystalline melting peak temperature of atleast 260° C. and an amorphous polyetherimide resin as the primaryconstituents, via holes (through holes) 13 are formed which pass throughthe insulating substrate 11, a metallic foil 14 is embedded within thegrooves 12 so that the surface of the foil protrudes to the surface ofthe insulating substrate, and a conductive material 15 formed by curinga conductive paste is used to fill the via holes 13. The upper and lowersurfaces of the insulating substrate 11, including the metallic foil 14,have been smoothed and flattened.

The lowest layer substrate 2 is of exactly the same construction as theuppermost layer substrate 1, and differs only in the fact that thegrooves 12 for forming the wiring circuit are formed in the lowersurface of the insulating substrate 11.

The inner layer substrate 3 is typically a film, a thin plate or a sheetof a thickness of no more than 100 μm, wherein grooves 12 for forming awiring circuit are formed in one surface (the upper surface in thefigure) of an insulating substrate 111 formed from a film, a thin plateor a sheet of an identical thermoplastic resin composition to theuppermost layer substrate 1, via holes 13 which pass through theinsulating substrate 11 are formed in a portion of the grooves 12, and aconductive material 15 formed by curing a conductive paste is used tofill the grooves 12 and the via holes 13. The upper and lower surfacesof the conductive paste 15, including the metallic foil 14, have beensmoothed and flattened.

The inner layer substrate 4 is of exactly the same construction as theinner layer substrate 3 described above, and differs only in the factthat the grooves 12 for forming the wiring circuit are formed in thelower surface of the insulating substrate 11.

The lowest layer substrate 2, the inner layer substrates 4 and 3, andthe uppermost layer substrate 1 are laminated together in that sequence,and then bonded together and integrated into a single unit by thermalfusion, and the wiring circuits of each of the substrates 1 to 4, andthe wiring for establishing the electrical connections between each setof adjacent substrates 1 to 4 is formed from the conductive material 15produced by curing a conductive paste.

The polyarylketone resin with a crystalline melting peak temperature ofat least 260° C., which represents one of the primary constituents ofthe thermoplastic resin composition used for forming the insulatingsubstrate 11, is a thermoplastic resin comprising an aromatic linkage,an ether linkage and a ketone linkage within the structural unit, andrepresentative examples include polyetherketones, polyetheretherketonesand polyetherketoneketones. Examples of commercially availablepolyetheretherketones include PEEK151G, PEEK381G, and PEEK450G (all ofwhich are manufactured by Victrex Co., Ltd.)

The amorphous polyetherimide resin is an amorphous thermoplastic resincomprising an aromatic linkage, an ether linkage and an imide linkagewithin the structural unit, and there are no other particularrestrictions on the structure. Examples of commercially availablepolyetherimides include Ultem CRS5001 and Ultem 1000 (both manufacturedby General Electric Company).

The actual resin composition of the thermoplastic resin compositiondescribed above is preferably produced by mixing 20 to 50 parts byweight of an inorganic filler with 100 parts by weight of athermoplastic resin composition formed from 70 to 25% by weight of thepolyarylketone resin and 30 to 75% by weight of the amorphouspolyetherimide resin.

The reason that the content of the polyarylketone resin is restricted towithin a range from 70 to 25% by weight is because if the contentexceeds 70% by weight, then the crystallinity becomes very high, makinglamination more difficult when producing a multilayer structure, whereasif the content is less than 25% by weight, then the crystallinity of theoverall composition falls, and the reflow heat resistance decreases evenif the crystalline melting peak temperature is greater than 260° C.

Similarly, the reason that the content of the amorphous polyetherimideresin is restricted to within a range from 30 to 75% by weight isbecause if the content is less than 30% by weight, then thecrystallinity becomes very high, making lamination more difficult whenproducing a multilayer structure, whereas if the content exceeds 75% byweight, then the crystallinity of the overall composition falls, and thereflow heat resistance decreases even if the crystalline melting peaktemperature is greater than 260° C.

Inorganic fillers can also be added to a thermoplastic resin compositionsuch as that described above.

There are no particular restrictions on the type of inorganic filler,and any known filler can be used. Specific examples of such inorganicfillers include talc, mica, glass flakes, boron nitride (BN), calciumcarbonate flakes, aluminum hydroxide flakes, silica flakes, andpotassium titanate flakes. These fillers may be used singularly, or incombinations of two or more different fillers. Scale-like flakes ofinorganic fillers with an average particle diameter of no more than 15μm and an aspect ratio (particle diameter/thickness) of more than 30 areparticularly preferred, as they enable the ratio of the coefficients oflinear expansion ratio in the in-plane direction and the thicknessdirection to be suppressed to a low level, thereby suppressing theoccurrence of cracking within the board during thermal shock cycletesting.

The quantity of these types of inorganic fillers added is preferablywithin a range from 20 to 50 parts by weight per 100 parts by weight ofthe thermoplastic resin composition. If the quantity exceeds 50 parts byweight, then problems including unsatisfactory dispersion of theinorganic filler develop, and the coefficient of linear expansion ismore likely to vary. In contrast, if the quantity of the filler is lessthan 20 parts by weight, then the difference in the coefficients oflinear expansion of the glass stamper used in the thermal moldingprocess and the insulating substrate 11 can cause a contraction in thedimensions of the insulating substrate 11, and the effect of theinvention in reducing the coefficient of linear expansion and improvingthe dimensional stability is diminished, and in addition, internalstress develops during the reflow process as a result of the differencein the coefficient of linear expansion, making the board moresusceptible to warping and twisting.

Other resins, and additives other than the inorganic fillers describedabove may also be added to a thermoplastic resin composition of thepresent invention, provided such addition does not impair the propertiesof the composition, and examples of these other additives includestabilizers, ultraviolet light absorbers, light stabilizers, nucleationagents, coloring agents, lubricants and flame retardants.

Each of these additives, including the inorganic fillers, can be addedusing known methods, such as the methods (a) and (b) described below.

-   (a) A method in which each of the additives is mixed at a high    concentration (for example, a quantity of 10 to 60% by weight) with    the polyarylketone resin and/or the amorphous polyetherimide resin    to generate a master batch, and this master batch is then mixed with    the resins to be used and the concentration adjusted appropriately,    before the mixture is finally blended mechanically using a kneader    or an extruder.-   (b) A method in which each of the additives is added directly to the    resins to be used, and then blended mechanically using a kneader or    an extruder.

Of these two methods, the method (a) is preferable in terms ofdispersibility and workability. In addition, the surface of theinsulating substrate 11 may also be subjected to appropriate embossingor corona treatment or the like, in order to improve handling.

Furthermore, the aforementioned conductive material 15 is produced byheating and curing a conductive paste, and examples of suitableconductive pastes include resin based low temperature curing pastes suchas silver (Ag) paste, silver (Ag)-palladium (Pd) paste, and copper (Cu)paste.

Next is a description of a method of manufacturing a multilayer wiringboard of this embodiment, based on FIGS. 2A-2D through FIGS. 6A-6B.

First is a description of a method of manufacturing the outermost layersubstrates (the uppermost layer substrate and the lowest layersubstrate) and the inner layer substrates, followed by a description ofa method of manufacturing a multilayer wiring board using theseoutermost layer substrates and inner layer substrates.

(1) Method of Manufacturing an Outermost Layer Substrate

First, as shown in FIG. 2A, an insulating substrate 21 formed from athermoplastic resin composition comprising a polyarylketone resin with acrystalline melting peak temperature of at least 260° C. and anamorphous polyetherimide resin as the primary constituents is prepared.

This insulating substrate 21 is provided as a film, a thin plate or asheet. Examples of suitable methods for molding the substrate includeconventionally known methods such as extrusion casting methods using a Tdie, or calender methods, and although there are no particularrestrictions on the method employed, extrusion casting methods using a Tdie are preferred from the viewpoints of sheet film formation andproduction stability. The molding temperature in such a casting methodusing a T die can be suitably adjusted in accordance with the fluidityand the film formation properties of the composition, althoughgenerally, the temperature should be greater than the crystallinemelting peak temperature of the polyarylketone resin (260° C.), but nomore than 430° C.

Next, as shown in FIG. 2B, a laser or a mechanical drill or the like isused to open through holes 22 in predetermined positions within theinsulating substrate 21, which then function as via holes 13.

Next, as shown in FIG. 2C, the via holes 13 are filled with a conductivepaste 23 using a squeegee printing technique or the like. Subsequently,this conductive paste 23 is heated for 30 to 60 minutes at a temperatureof 120 to 160° C., thereby forming a conductive material 15.

Subsequently, any residual conductive material 15 left on the surface ofthe insulating substrate 21 is ground off and removed using a techniquesuch as mechanical polishing, yielding a wiring substrate 24 with thevia holes 13 filled with a conductive material 15 formed by curing aconductive paste, and with the surface of the insulating substrate 21smoothed to a predetermined surface roughness.

Next, as shown in FIG. 3A, an impressing jig 32 with texture formed onone of the principal surfaces is positioned on top (on one surface) ofthe insulating substrate 21 with a metallic foil 31 disposedtherebetween, while an elastic film 33 which displays a lower modulus ofelasticity than the insulating substrate 21 at temperatures lower thanthe glass transition temperature (Tg1) of the insulating substrate 21 ispositioned on the lower surface (the other surface) of the insulatingsubstrate 21. Subsequently, as shown in FIG. 3B, the impressing jig 32is pressed against the insulating substrate 21, and thermal molding isperformed at a temperature greater than the glass transition temperature(Tg2) of the elastic film 33 but lower than the crystallization starttemperature (Tcs) of the insulating substrate 21.

Here, the glass transition temperature (Tg1) and the crystallizationstart temperature (Tcs) of the insulating substrate 21, and the glasstransition temperature (Tg2) of the elastic film 33 can be measuredusing differential scanning calorimetry (DSC). These temperatures can bedetermined from the DSC profile obtained by heating a measurement sampleat a heating rate of 10° C./minute, for example.

For example, in the case of an insulating substrate comprising 40% byweight of a polyarylketone resin with a crystalline melting peaktemperature of at least 260° C., and 60% by weight of an amorphouspolyetherimide resin, the glass transition temperature (Tg1) is 185° C.and the crystallization start temperature (Tcs) is 225° C.

Furthermore, provided the elastic film 33 displays a lower modulus ofelasticity than the insulating substrate 21 at temperatures lower thanthe glass transition temperature (Tg1) of the insulating substrate 21,then any film is acceptable, and an elastic film formed from asyndiotactic polystyrene is an ideal example. The glass transitiontemperature (Tg2) of this elastic film 33 is 100° C.

FIG. 4 is a graph showing the temperature dependency of the modulus ofelasticity of the insulating substrate 21 and the elastic film 33. Inthe figure, A represents the curve for an insulating substratecomprising 40% by weight of a polyarylketone resin with a crystallinemelting peak temperature of at least 260° C., and 60% by weight of anamorphous polyetherimide resin, and B represents the curve for anelastic film formed from a syndiotactic polystyrene.

As shown in FIG. 4, the elastic film 33 undergoes softening prior to thesoftening of the insulating substrate 21, and as a result, theinsulating substrate 21 flexes, but plastic deformation does not occur,and consequently the metallic foil 31 is able to cut efficiently.

The temperature of thermal molding is preferably greater than the glasstransition temperature (Tg2) of the elastic film 33, and lower than thecrystallization start temperature (Tcs) of the insulating substrate 21,and even more preferably, should be lower than the glass transitiontemperature (Tg1) of the insulating substrate 21.

As a result of thermal molding, a pattern is stamped into the metallicfoil 31, as shown in FIG. 3C, due to the difference in the modulus ofelasticity between the elastic film 33 and the insulating substrate 21,and a difference in fusion strength develops which corresponds with thediffering pressure applied by the texture of the impressing jig 32. Forexample, the metallic foil 31 a embedded within the insulating substrate21 has a high fusion strength and is bonded strongly to the insulatingsubstrate 21, whereas the remaining sections of the metallic foil 31 bhave only very weak fusion strength, and can be easily stripped awayfrom the insulating substrate 21.

Consequently, as shown in FIG. 3D, the unnecessary metallic foil 31 bcan be easily stripped off the insulating substrate 21 and removed.

The conductive material 15 formed by curing a conductive paste and a viahole 13 need not necessarily exist beneath the metallic foil 31,although by ensuring that the conductive material 15 is present beneaththe entire metallic foil 31, the difference in fusion strength ismagnified, and the unnecessary metallic foil 31 b can be removed evenmore easily. Furthermore, there are no particular restrictions on thetype or the thickness of the metallic foil 31, although the thickness ofthe metallic foil 31 is preferably less than the thickness provided bythe height difference of the texture of the impressing jig 32. Forexample, in the case of a height difference of the texture of theimpressing jig 32 of 50 μm, a surface roughened conductive copper foil(metallic foil) with a thickness of 9 to 35 μm was used, although evenwith other thickness values, stripping of the unnecessary conductivecopper foil was still possible.

Following removal of the unnecessary metallic foil 31 b from theinsulating substrate 21, as shown in FIG. 3E, both surfaces of theinsulating substrate 21 including the metallic foil 31 a and theconductive material 15 are subjected to thermal molding using a moldingdie not shown in the figure, at a pressure of 0.5 to 10 kg/cm² and at atemperature lower than the crystallization start temperature (Tcs) ofthe insulating substrate 21, thereby smoothing and flattening bothsurfaces of the insulating substrate 21 including the metallic foil 31 aand the conductive material 15.

Using the steps described above, the metallic foil 14 can be embedded inan outermost layer substrate, namely the substrate 21, with the surfaceof the foil protruding to the surface of the insulating substrate, andan uppermost layer substrate 34 (or a lowest layer substrate 35) withthe via holes 13 filled with the conductive material 15 can be produced.

(2) Method of Manufacturing an Inner Layer Substrate

First, as is shown in FIG. 5A, convex sections 42 of a stamper 41 arethermally transferred to a surface (one surface) of an insulatingsubstrate 21 formed from an identical thermoplastic resin composition tothat used for the outermost layer substrates described above. Theconditions for this thermal transfer include, for example, a temperatureof 175 to 205° C. and a pressure of 20 to 60 kg/cm².

This thermal transfer forms wiring circuit formation grooves 43 in thesurface of the insulating substrate 21, as shown in FIG. 5B.

The stamper 41 is constructed from a material with good releasabilityrelative to the insulating substrate 21 such as glass or ceramic. Heatresistant glass of thickness 3 to 5 mm is particularly suitable. Thestamper 41 is produced by forming a resist mask on the surface of a heatresistant glass plate using photolithography techniques, andsubsequently forming the convex sections 42 which correspond with thewiring circuit pattern using sand blasting techniques or the like.

Next, as shown in FIG. 5C, a laser or a mechanical drill or the like isused to open through holes 44 in predetermined positions within theinsulating substrate 21, which then function as via holes 13. These viaholes 13 may also be formed by the stamper 41, at the same time as theformation of the wiring circuit formation grooves 43.

Next, as shown in FIG. 5D, the wiring circuit formation grooves 43 andthe via holes 13 are filled with a conductive paste 45 using a squeegeeprinting technique or the like. Subsequently, this conductive paste 45is heated for 30 to 60 minutes at a temperature of 120 to 160° C.,thereby forming a conductive material 15. This process enables theformation of a conductive circuit 46 and interlayer continuity sections47 at predetermined positions on the insulating substrate 21.

Subsequently, as shown in FIG. 5E, a sanding device 48 is used to grindoff and remove any residual conductive material 15 left on the surfaceof the insulating substrate 21, and smooth the surface of the insulatingsubstrate 21, yielding an inner layer substrate 49 (or an inner layersubstrate 50) with a conductive circuit 46 and interlayer continuitysections 47 formed at predetermined positions on the insulatingsubstrate 21.

(3) Method of Manufacturing a Multilayer Wiring Board

First, as shown in FIG. 6A, a cushion film 52 with good elasticity andreleasability, a lowest layer substrate 35, an inner layer substrate 49,an inner layer substrate 50, an uppermost layer substrate 34, andanother cushion film 52 with good elasticity and releasability areoverlaid, in the above sequence, within a lamination jig 51.Subsequently, the layers from the lowest layer substrate 35 through tothe uppermost layer substrate 34 are bonded together and integrated intoa single unit by thermal fusion under conditions including a temperatureof 200 to 260° C. and a pressure of 20 to 60 kg/cm².

Using the above process, a multilayer wiring board 53 can be producedcomprising the lowest layer substrate 35, the inner layer substrate 49,the inner layer substrate 50 and the uppermost layer substrate 34 whichhave been bonded together and then integrated into a single unit bythermal fusion.

According to the present embodiment, the grooves 12 for forming a wiringcircuit are formed in the insulating substrate 11 formed from athermoplastic resin composition comprising a polyarylketone resin with acrystalline melting peak temperature of at least 260° C. and anamorphous polyetherimide resin as the primary constituents, the viaholes 13 which pass through the insulating substrate 11 are formed, themetallic foil 14 is embedded within the grooves 12 so that the surfaceof the foil protrudes to the surface of the insulating substrate, andthe conductive material 15 formed by curing a conductive paste is usedto fill the via holes 13, thereby generating a wiring substrate, andconsequently a multilayer wiring board with excellent heat resistance, ahigh degree of mechanical strength and excellent electrical insulation,which is capable of low temperature fusion without the occurrence ofresin flow, enables the problems resulting from resin flow such aswiring distortion to be resolved, and enables high precision, finelydetailed conductive wiring can be produced. As a result, a multilayerwiring board with excellent electrical characteristics and reliabilitycan be provided.

Furthermore, by appropriate selection of both the thermoplastic resincomposition and the type and shape of the conductive wiring, a varietyof different wiring substrates can be formed, and as a result, bycombining wiring substrates with different specifications, the presentinvention can be applied to multilayer wiring boards with a wide varietyof specifications.

In addition, the combination of a variety of wiring substrates ofdifferent specifications makes the invention ideally suited to lowvolume high mix type manufacturing configurations. Furthermore, by usinga conductive paste for the electrical connections, wiring formationusing wet processes becomes unnecessary, meaning the environmentalimpact can be reduced.

Second Embodiment

FIG. 7 is a cross-sectional diagram showing an IC package board (asemiconductor device mounting board) of a second embodiment of thepresent invention.

This IC package board is a multilayer interposer board 61 comprising alowest layer substrate 35, an inner layer substrate 49 and an innerlayer substrate 50 laminated together in this sequence and integratedinto a single unit by thermal fusion, and an IC chip (semiconductordevice) 63 is fixed directly to the top of the inner layer substrate 50which functions as an IC chip (semiconductor device) mounting section,so that the pins (terminals) 64 of the IC chip 63 and the conductivecircuit 46 are electrically connected, and the IC chip 63 is then sealedwith a sealing resin 65 such as an epoxy resin.

In order to manufacture this IC package board, first, as shown in FIG.8A, a cushion film 52 with good elasticity and releasability, a lowestlayer substrate 35, an inner layer substrate 49, an inner layersubstrate 50, and another cushion film 52 with good elasticity andreleasability are overlaid, in the above sequence within a laminationjig 51. Subsequently, the layers from the lowest layer substrate 35through to the inner layer substrate 50 are bonded together andintegrated into a single unit by thermal fusion under conditionsincluding a temperature of 200 to 260° C. and a pressure of 20 to 60kg/cm², thereby forming the multilayer interposer board 61.

Next, as shown in FIG. 8B, the IC chip 63 is mounted on top of the innerlayer substrate 50 which functions as an IC chip mounting section, andthis IC chip 63 is then subjected to thermocompression bonding using ahot plate 68 at a predetermined temperature, such as a temperaturewithin a range from 175 to 205° C., which is lower than thecrystallization start temperature of the insulating substrate. As shownin FIG. 8C, the pins 64 of the IC chip 63 are connected electricallywith the conductive circuit 46.

Next, a sealing resin agent 69 such as an epoxy resin is applied so asto cover the IC chip 63, and this sealing resin agent 69 is then heatedand cured, thereby forming the sealing resin 65.

In this manner, by keeping the temperature during the mounting of the ICchip 63 to a temperature of 175 to 205° C., lower than thecrystallization start temperature of the insulating substrate,subsequent low temperature lamination becomes possible. Furthermore, arapid heat curing type epoxy resin could also be supplied to the top ofthe inner layer substrate 50 and then bonded by thermocompressionbonding.

This second embodiment provides the same effects as those described fora multilayer wiring board of the first embodiment.

Moreover, because an IC chip 63 is fixed directly onto the inner layersubstrate 50 which functions as an IC chip mounting section, a highprecision, finely detailed, and high density IC package board can beproduced.

Third Embodiment

FIG. 9 is a cross-sectional diagram showing an IC package board (asemiconductor device mounting board) of a third embodiment of thepresent invention.

This IC package board differs from the IC package board of the secondembodiment in that whereas in the IC package board of the secondembodiment, the IC chip 63 was fixed directly onto the inner layersubstrate 50 which functions as the IC chip mounting section, in the ICpackage board of this embodiment, the IC chip 63 is fixed to the top ofthe inner layer substrate 50, which functions as the IC chip mountingsection, via an IC chip fixing adhesive 62.

In order to manufacture this IC package board, a multilayer interposerboard 61 is first prepared in the same manner as described for the ICpackage board of the second embodiment, and then, as shown in FIG. 10A,the IC chip fixing adhesive 62 is applied to the top of the inner layersubstrate 50 which functions as the IC chip mounting section, an IC chip63 is mounted to a fixed position on this IC chip fixing adhesive 62,and the IC chip 63 is then subjected to thermocompression bonding usinga hot plate 68 at a predetermined temperature, such as a temperaturewithin a range from 175 to 205° C., which is lower than thecrystallization start temperature of the insulating substrate. As shownin FIG. 10B, the pins 64 of the IC chip 63 are connected electricallywith the conductive circuit 46.

Next, a sealing resin agent 69 such as an epoxy resin is applied so asto cover the IC chip 63 and the IC chip fixing adhesive 62, and thissealing resin agent 69 is then heated and cured, thereby forming asealing resin 65.

This third embodiment provides the same effects as those described for amultilayer wiring board of the first embodiment.

Moreover, because the IC chip 63 is fixed to the inner layer substrate50, which functions as an IC chip mounting section, via the IC chipfixing adhesive 62, good insulation can be ensured by the IC chip fixingadhesive 62 even in those cases in which the insulation between theinner layer substrate 50 and the chip 63 is not totally reliable, andconsequently a high precision, finely detailed, and high density ICpackage board can be produced.

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 5. A method ofmanufacturing a multilayer wiring board comprising the steps of:performing thermal molding on either one surface or both surfaces of aninsulating substrate formed from a thermoplastic resin compositioncomprising a polyarylketone resin with a crystalline melting peaktemperature of at least 260° C. and an amorphous polyetherimide resin asprimary constituents, at a temperature which is higher than a glasstransition temperature but lower than a crystallization starttemperature of said thermoplastic resin composition, thereby forming aconductive region comprising grooves, via holes, or a combination ofgrooves and via holes on said one surface or both surfaces, subsequentlyfilling said conductive region with a conductive paste and forming awiring circuit in which said conductive paste functions as conductivewiring, thereby forming a wiring substrate comprising said insulatingsubstrate and said wiring circuit, and subsequently laminating aplurality of said wiring substrates together, bonding and crystallizinginsulating substrates of said wiring substrates by thermal fusion at atemperature higher than said Crystallization start temperature, andelectrically connecting said plurality of wiring substrates with saidconductive paste.
 6. A method of manufacturing a multilayer wiring boardaccording to claim 5, wherein said insulating substrate is formed froman amorphous film produced by molten mixing and rapid cooling of athermoplastic resin composition comprising a polyarylketone resin with acrystalline melting peak temperature of at least 260° C. and anamorphous polyetherimide resin as primary constituents.
 7. A method ofmanufacturing a multilayer wiring board comprising the steps of:positioning an impressing jig on one surface of an insulating substrateformed from a thermoplastic resin composition comprising apolyarylketone resin with a crystalline melting peak temperature of atleast 260° C. and an amorphous polyetherimide resin as primaryconstituents, with a metallic foil disposed therebetween, andpositioning an elastic film, which displays a lower modulus ofelasticity than said insulating substrate at temperatures lower than aglass transition temperature of said insulating substrate, on anothersurface of said insulating substrate, subsequently using said impressingjig for performing thermal molding at a temperature which is higher thana glass transition temperature of said elastic film but lower than acrystallization start temperature of said insulating substrate, andsubsequently peeling off said metallic foil, so that only sections ofsaid metallic foil in positions corresponding with convex sections ofsaid impressing jib are fused to said insulating substrate.
 8. A methodof manufacturing a multilayer wiring board comprising the steps of:performing thermal molding on at least one surface of an insulatingsubstrate comprising a thermoplastic resin composition with acrystalline melting peak temperature of at least 260° C., at atemperature which is higher than a glass transition temperature butlower than a crystallization start temperature of said thermoplasticresin composition, thereby forming a conductive region comprisinggrooves, via holes, or a combination of grooves and via holes on said atleast one surface, subsequently filling said conductive region with aconductive paste and forming a wiring circuit, thereby forming a wiringsubstrate comprising said insulating substrate and said wiring circuit,and subsequently laminating a plurality of said wiring substratestogether, bonding and crystallizing insulating substrates of said wiringsubstrates by thermal fusion at a temperature higher than saidcrystallization start temperature, and electrically connecting saidplurality of wiring substrates with said conductive paste.